装备名称 Equipment Name

管式LPCVD装备  Horizontal LPCVD

装备型号 Equipment Model

LD-420/LD-420L/LD-420MAX

装备用途 Equipment Application

TOPCon电池隧穿氧化层、i-poly、D-poly低压化学气相沉积。

Deposition of tunnel oxide layer, i-Poly and D-poly for TOPCon solar cells.

手艺特点  Features

1、低压与热壁工艺特征，成膜匀称性、致密性好。

Low pressure and hot wall process characteristics, with better film uniformity and good compactness.

2、LPCVD工艺特征，基片密排对成膜速率影响小，单管装片量大。
LPCVD process, densely loaded substrates have little effect on the coating rate, with large loading capacity in single tube.

3、更多温区设置，可靠包管片间匀称性。
More temperature zones to ensure the uniformity between wafers reliably.

4、自力调理分段进气，填补气流耗尽效应。
Independently adjustable segmented air inlet to compensate for the airflow depletion effect.

装备参数  Parameters