装备名称 Equipment Name

管式A&P装备  Horizontal PEALD (A&P)

装备型号 Equipment Model

PD-520L/PD-520MAX

装备用途 Equipment Application

AlO+SiN薄膜沉积。
AlO+SiN Thin-film Deposition.

手艺特点  Features

1、原子层沉积工艺特征，成膜匀称性好。

Atomic layer deposition process, with better film uniformity.

2、同机台或同管完成多层膜沉积，镌汰工艺环节，有用提升良率、降低碎片率。
Multi-layer thin film deposited in the same process equipment or same furnace tube, reducing process steps and wafer breakage rate, improving yield effectively.

3、自主研发液态源前驱体蒸气运送与前驱体快速切换手艺。
Independent R&D of liquid source precursor vapor delivery and precursor rapid switching technology.

4、顺应差别前驱体、差别质料钝化层沉积，工艺拓展空间大。
Suitable for deposition of passivation layer for different precursors and materials, with a large space for process expansion.

装备参数  Parameters