装备名称 Equipment Name

板式透明导电薄膜沉积装备(RPD/PAR/PVD)  Inline TCO Coating Equipment (Reactive Plasma Deposition, RPD/PAR),and Magnetron Sputter,PVD

装备型号 Equipment Model

PAR5500A

装备用途 Equipment Application

板式物理镀膜装备用于镀着透明导电薄膜于衬底(硅片、玻璃片、柔性基板)。

In-line physical coating equipment for Transparent Conductive Oxide (TCO) coating on wafer,glass plate or flexible substrate.

镀膜原理 Coating Principle

1、磁控溅射沉积。

Magnetron Sputter (PVD).

2、反应式等离子体沉积。

Reactive Plasma Deposition (RPD).

手艺特点  Features

1、PVD具有多阶阴极，可以制备种子层与多种折射率的叠层TCO。

Multiple cathode operation for seed layer and multiple refractive index tandem TCO.

2、RPD具有无高能离子轰击衬底特点，能制备高少子迁徙率的TCO。
No bombardment on the substrate while keeping high mobility.

装备参数  Parameters